| 摘要 |
Polyorganosiloxane which are useful as resist materials for use in microprocesses such as large scale integration device fabrication are those of the formula <IMAGE> where R1 is a monovalent hydrocarbon group having 1 to 6 carbon atoms; R2 is a hydrogen atom or a monovalent hydrocarbon group having 1 to 6 carbon atoms; x and z are positive numbers; y is zero or a positive number; and x, y, and z have values such that their ratios are 0.3</=(x+y)/z</=4; and zero </=y/x</=100. The polyorganosiloxanes can be prepared by cohydrolysis or condensation reactions of hydrolyzable group-containing organosilanes or disiloxanes with tetrafunctional hydrolyzable silanes.
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