| 摘要 |
PURPOSE:To correctly and quickly adjust a mask and a wafer by processing matching deviation between a plurality of marks on the mask side and a plurality of marks on the wafer side based on a predetermined operational formula and adjusting transfer magnification of a transfer optical system or by moving the transfer optical system based on this processing result in order to adjust transfer deviation. CONSTITUTION:In an optical path of laser light l to be emitted from a laser light source 10, standard masks 16 and transfer optical systems 17 having correct alignment marks 1 as well as standard wafers 18 having correct alignment marks 2 are arranged at a plurality of spots respectively, while pulse-shaped output is detected at the spot, where laser light l on A in a photoelectric converter element 20 intersects the alignment marks 1 and 2 to measure the alignment marks 1 and 2 at two spots separated by the distances C and D in the directions x and y in the standard masks 16 and the standard wafers 18 respectively to find a matching deviation amount. These operations are performed by an operation processing circuit 21 for performing automatic adjustment of amplification of the transfer optical system 17 based on the found amplification Mx and My by means of an adjustment mechanism 22. |
