| 摘要 |
PURPOSE: To measure an exposure dose with high sensitivity and high accuracy by reducing the fluorescence component inherent to a fluorescent glass element and selectively taking in a fluorescence pulse component of a specific wavelength region where the fluorescence corresponding to an exposure dose appears most largely. CONSTITUTION: One of optically diffracted ultraviolet pulses is applied to a radiation exposure fluorescent glass element 15 and the other one of them is applied to a standard fluorescent glass element 17 through a translucent mirror 14 and a reflecting mirror 16 and the exposure fluorescence pulses generated from the respective fluorescence detection surfaces of both elements 15, 17 are sent to photomultiplier tubes 22, 23 while specific wavelength ranges are selected (20, 21) and the exposure fluorescence pulses are sent to a sampling gate circuits 27, 28 while the standard fluorescence pulses are sent to a sampling gate circuit 30. The exposure and standard fluorescence pulses sampled by the circuits 28, 30 during set periods 32, 33 and the fluorescence component slow in attenuation sampled by the circuit 27 are integrated by integrators 34-36 and redish orange fluorescence (RPL) in fluorescence quantity is detected from the integrated values and the fluctuations of an RPL component caused by fluctuations in the intensity of ultraviolet pulses are corrected to be calculated (37) as the exposure dose of the element 15.
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