发明名称 METHOD OF MANUFACTURING OPTICALLY STRUCTURED LAYER
摘要 <p>PURPOSE: To improve dimensional stability of a mask and to easily produce at a low cost by using a material having holes which does not transmits light as an exposure mask. CONSTITUTION: A material (A) which does not transmit light and has holes is used as an exposure mask to expose a positive photoresist (B). The material (A) is preferably a colored thick paper or a base material lined with copper and is preferably 0.01 to 5mm thick. Moreover, the diameter of the holes of the material (A) is preferably made larger than the diameter of the holes in the base material to be exposed. As for the resist (B), a thermosetting epoxy resin compsn. is preferably used.</p>
申请公布号 JPH03102357(A) 申请公布日期 1991.04.26
申请号 JP19900192825 申请日期 1990.07.20
申请人 CIBA GEIGY AG 发明人 EBUARUTO ROZERUTO;BIITO HONETSUGAA;KURUTO MAIYAA
分类号 G03F1/08;G03F7/20;H05K3/00;H05K3/28;H05K3/34 主分类号 G03F1/08
代理机构 代理人
主权项
地址
您可能感兴趣的专利