| 摘要 |
<p>PURPOSE:To use a synthetic photosensitive resin which is superior to natural resins in terms of sensitivity and stability and to eliminate the need for an intermediate layer by dyeing the relief patterns formed by using the copolymerized component of a specific resin with a dye having an anion group, then treating the patterns with a soln. of tannic acid and subjecting the patterns to a heating treatment. CONSTITUTION:A monomer having the structure of ternary amine or quaternary ammonium salt, the monomer expressed by formula I and other monomers selected mainly in terms of photosensitization are copolymerized on the base material for dyeing. In the formula, R denotes H or CH3; n denotes 1 to 4 integer. The relief patterns formed by using such photosensitive resin are dyed with the dye having the anion group and after the dyed patterns are treated with the soln. of the tannic acid, the patterns are subjected to a heating treatment. The color filters are formed without having the intermediate layer by repeating the above-mentioned process. The need for the intermediate layer is eliminated in this way while the synthetic photosensitive resin superior to the natural resins in terms of the sensitivity and stability is used.</p> |
