METHOD FOR CORRECTING DEFECT OF EMULSION MASK OR THE LIKE

摘要

PURPOSE:To allow the easy conduct of an operation to adjust the hole of an aperture to the shape of a defect part without increasing the cost of device constitution by shaping a UV laser beam for removing the defect part by the aperture so as to comply with the shape of the defect part and irradiating the defect part with this laser beam. CONSTITUTION:The hole of the aperture 5 is irradiated with the UV light 2 of a low power at which an emulsion layer is not worked and the hole image of the aperture is projected to the defect part of the emulsion mask 7 at the time of matching the hole of the aperture 5 with the defect part of the emulsion mask 7. The fluorescent image emitted from a glass substrate when the substrate is excited by the UV light 2 is then observed and the adjustment of the aperture 5 is carried out. The aperture image is, therefore, observed simply by adjusting the oscillation output of a laser oscillator 1 without using a special lens. This method is advantageous at the time of formation of the device in this way.