ANISOTROPIC PLASMA ETCHING OF TUNGSTEN,申请号GB19870017107-传众专利搜索

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发明名称	ANISOTROPIC PLASMA ETCHING OF TUNGSTEN
摘要
申请公布号	GB2195294(B)	申请公布日期	1991.04.24
申请号	GB19870017107	申请日期	1987.07.20
申请人	* INTEL CORPORATION	发明人	CHI-HWA * TSANG
分类号	H01L21/302;C23F4/00;H01L21/3065;H01L21/3213	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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