| 发明名称 |
PROCEDURE FOR THE INVESTIGATION OF PHYSICAL PROPERTIES OF THIN LAYERS |
| 摘要 |
<p>The invention relates to a procedure for the investigation of the physical properties of thin layers using polarised light to irradiate the layer to be investigated and guiding the reflected or transmitted light onto an imaging system. Optical waveguide modes are excited in the layer to be investigated by irradiation with the polarised light.</p> |
| 申请公布号 |
EP0403769(A3) |
申请公布日期 |
1991.04.24 |
| 申请号 |
EP19900108208 |
申请日期 |
1990.04.30 |
| 申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
HICKEL, WERNER, DR.;KNOLL, WOLFGANG, DR. |
| 分类号 |
G01N21/21;G01N21/552;G01N21/84;(IPC1-7):G01N21/55;G01N21/00;G01N21/59 |
主分类号 |
G01N21/21 |
| 代理机构 |
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| 主权项 |
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