| 摘要 |
<p>PURPOSE:To avert the deterioration in the patterning accuracy of dye layers due to steps by embedding a high-polymer resin contg. dyes into apertures of a resist film, thereby forming dye layers. CONSTITUTION:The high-resolution resist film 2 for patterning is applied over the entire surface of a substrate 10 and the hole parts 7 between the respective underlying step parts 1 are embedded by the resist film 2. The resist film 2 is then selectively apertured and the entire surface is coated with the high-polymer resin contg. the dye and having prescribed optical characteristics to form the 1st dye layer 4a. This layer is etched back to allow the 1st layer 4a to remain in the apertures of the resist film 2 and to remove the dye layer 4a of the unnecessary parts. The resist film 2 is then removed. The high-polymer resins contg. the dyes different form each other are disposed above respective photodetecting parts 3 by repeating these stages, by which the dye layers 4b, 4c and 4d, etc., having the respectively prescribed optical characteristics are formed above the respective photodetecting parts 3; thereafter, a flattening layer (cover layer) 5 is formed over the entire surface. The detection in filter characteristics due to steps, etc., at the time of deposition of the resin is averted in this way.</p> |
