发明名称 MICROMECHANICAL SWITCH
摘要 <p>In order to make a micromechanical switch a first sacrificial layer is formed on a substrate (1). A second sacrificial layer (4) is then formed as an island on the first sacrificial layer (3). A switch element layer (7) of resilient material is then formed on the second sacrificial layer (4), and the outline (5) of a switch element (8) is defined on the switch element layer (7). The outline (12) of a window is then defined, and the second sacrificial layer (4) is etched through the window using an etchant which laterally undercuts that portion of the switch element layer (7) which is to form the switch element (8). The first sacrificial layer (8) is then etched through the window defined by the etched second sacrificial layer to define a cavity (13) beneath said portion, thereby defining the switch element (8).</p>
申请公布号 WO1991005284(A1) 申请公布日期 1991.04.18
申请号 GB1990001391 申请日期 1990.09.07
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