发明名称 |
Method for processing silver halide photographic materials, and developer and silver halide photographic material used therein. |
摘要 |
<p>A method for processing silver halide photographic materials comprising the step of: processing imagewise exposed silver halide photographic material using a developer containing at least one compound represented by general formula (X): <CHEM> wherein R1 and R2 each represents a hydrogen atom, an alkyl group containing from 2 to 8 carbon atoms, an alkenyl group containing from 3 to 8 carbon atoms, or an aralkyl group containing from 7 to 12 carbon atoms; or R1 and R2 are combined to form a ring; R3, R4, R5, and R6 each represents a hydrogen atom, or an alkyl group containing from 1 to 4 carbon atoms: and n represents an integer from 3 to 20. A developer for processing silver halide photographic materials comprising at least one compound represented by general formula (X), described above. A silver halide photographic material comprising: at least one compound represented by general formula (X min ): <CHEM> wherein R min 1 and R min 2 each represents a hydrogen atom, an alkyl group containing from 1 to 30 carbon atoms, an alkenyl group containing from 3 to 30 carbon atoms, or an aralkyl group containing from 7 to 30 carbon atoms; or R min 1 and R min 2 are combined to form a ring; R3, R4, R5, and R6 are the same as described above; and n min represents an integer from 2 to 50. A method for processing silver halide photographic materials comprising the step of: processing imagewise exposed silver halide photographic material comprising at least one compound represented by general formula (X min ), described above.</p> |
申请公布号 |
EP0422677(A1) |
申请公布日期 |
1991.04.17 |
申请号 |
EP19900119617 |
申请日期 |
1990.10.12 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KOJIMA, TETSURO, C/O FUJI PHOTO FILM CO., LTD.;OKUTSU, EIICHI, C/O FUJI PHOTO FILM CO., LTD.;KATOH, KAZUNOBU, C/O FUJI PHOTO FILM CO., LTD. |
分类号 |
G03C5/29;G03C1/043;G03C1/06;G03C5/30;G03C5/305 |
主分类号 |
G03C5/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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