| 摘要 |
PURPOSE:To obtain a scratchless specular titanium alloy substrate by using a high-strength titanium alloy capable of being thinned, and by polishing it with an abrasive or colloidal silica solution whose pH has been controlled to be less than 8 by means of an organic acid. CONSTITUTION:In the final polishing process of a titanium alloy substrate, colloidal silica solution whose pH has been controlled to be less than 8 by means of an organic acid is used as the abrasive, and one side or both side of the titanium alloy substrate are simultaneously polished. Thus, the surfaces of the titanium alloy substrate can be finished in a scratchless specular state. |
