| 摘要 |
PURPOSE:To make development uniform by a method wherein a developing tank containing a developer liquid rises so as to bring the whole surface of the resist film of a wafer held by a chuck mechanism into contact with the developer liquid at one time and also this developer is in contact with the resist film during the developing time through vibration of the developer by means of an vibrating plate. CONSTITUTION:A cylinder for reversal 33 is actuated to turn a chuck mechanism 25 up and a wafer 24 having a positive resist film 23 is put on the chuck mechanism 25 and is fixed there by suction. Next, the reversal cylinder 33 is actuated in opposite direction to rotate the whole body of a holding mechanism 21 by 180 deg. regarding the axis X and to reverse the wafer 24, which is held horizontally with the plane 26 of the resist film 23 facing downward. Next, a tank driving cylinder 30 is actuated to raise a developing tank 27 and accordingly to bring a developing liquid 29 in contact with the whole surface of the resist film 23 at one time. During this developing treatment, an vibrating plate is vibrated to stir the developer. Next, while continuing the vibration, a valve lock 36 is actuated to supply a rinsing liquid from the center at the bottom of the recess in the tank 27, so that the developer overflows the tank 27 and the rinsing liquid 40 substitutes for the developer inside the recess 28, thereby stopping the developing. Thus, the developing in the wafer surface can be made uniform. |
