发明名称 |
Method of preparing drawing data for charged beam exposure system |
摘要 |
A method of preparing drawing data for a charged beam exposure system includes: constructing, from pattern data having a multiple hierarchical structure, reiterative units disposed in an array without any gap formed therebetween; converting the pattern data into first figure processing data including a total figure and reiterative units within the total area; dividing the total area of the first figure into equal area processing data fields for a charged beam exposure system, each field including a whole number of reiterative units, if any, thereby producing second figure processing data; performing figure modification processing with respect to features in a field outside reiterative units in the field and separately with respect to the reiterative units within the field, thereby producing third figure processing data; and converting the third figure processing data into suitable drawing data for the charged beam exposure system.
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申请公布号 |
US5008830(A) |
申请公布日期 |
1991.04.16 |
申请号 |
US19880278452 |
申请日期 |
1988.12.01 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MORIIZUMI, KOICHI;FUJINO, TAKESHI |
分类号 |
H01L21/027;G06T11/00;H01J37/302 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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