| 摘要 |
PURPOSE:To obtain good images having a high luminance even if a diffusion plate is not used by using a substrate applied with working for scattering light on the rear surface as a thin-film transistor (TFT) substrate. CONSTITUTION:A light diffusing region 4 subjected to the working for the purpose of scattering light to uniformly admit the light to the liquid crystal is mounted on the rear surface of the TFT substrate 3 in such a manner that the grating direction coincides with the direction of a fluorescent lamp. If the rear surface of the TFT substrate is worked in such a manner, the TFT substrate can be detected by a substrate sensor for which a photocoupler is used in spite of using the existing apparatus for producing silicon semiconductors, for example, a dry etching device. The etching is thus executable in the same manner as for silicon substrates. Good images are obtd. in this way even if the diffusion plate is not used. |
