| 摘要 |
PURPOSE:To obtain an X-ray mask having high resistance for projection of X rays without impairing the properties of an X-ray transmitting thin film such as the transmittance of visible light and refractive index by projecting an electromagnetic wave on the X-ray transmitting thin film before the patterning of an X-ray absorber thin film. CONSTITUTION:An electromagnetic wave is projected on a thin film before the patterning of an X-ray absorber thin film 14 so that resistance for X-ray projection is provided. Namely, the X-ray transmitting thin film 11 comprising SiNx and the like is formed. Then, the electromagnetic wave such as SOR radiation light is projected. Thus, the formation of the X-ray transmitting thin film 11 having the resistance for the X-ray projection can be realized without changing the properties (transmittance of visible light, surface smoothness and adequate tensile stress) of the X-ray transmitting thin film 11 itself. The X-ray absorber thin film 14 is formed on the X-ray transmitting thin film 11 on which the electromagnetic wave is projected. Then, the film wherein the properties of the X-ray transmitting thin film itself is stable is obtained even after a thermal steps (resist baking and reaction ethcing) which are performed in a process for patterning said absorber thin film. In this way, a highly accurate X-ray mask having the highly accurate size of a minute pattern and position accuracy can be realized. |
