发明名称 PHOTORESIST COMPOSITION
摘要 PURPOSE: To selectively remove an exposed part or nonexposed part of a positive or negative photoresist coating film and to transfer an image to a base by incorporating a mixture of a specified resin binder and a photosensitive component into a photoresist compsn. CONSTITUTION: This photoresist compsn. contains a mixture of a resin binder and a photosensitive component. The resin binder contains a copolymer having phenol-based structural units in over the half amt. and cyclic alcohol-based structural units in less than the half amt. The density of the copolymer is controlled to such a degree that the amt. of the copolymer is not enough to prevent development of an exposed film of the photoresist in the developer of the photoresist. The photosensitive component is present in such an amt. that produces a latent image by exposure of the photoresist coating film to active radiation. Thereby, an exposed part or nonexposed part of the photoresist coating film can be selectively removed and an image can be transferred to a base.
申请公布号 JPH0387746(A) 申请公布日期 1991.04.12
申请号 JP19900132443 申请日期 1990.05.22
申请人 SHIPLEY CO INC 发明人 JIEEMUZU CHIYATSUKEREI;JIYOOJI DABURIYU OOSURA;ROJIYAA SHINTA
分类号 G03F7/023;G03F7/029;G03F7/038;H01L21/027 主分类号 G03F7/023
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