| 发明名称 |
Positive resist composition. |
| 摘要 |
<p>Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and the quinonediazide sulfonate of at least one phenolic compound selected from vinylphenol compounds and isopropenylphenol compounds as a photosensitive agent. It is suitable for use in minute processing.</p> |
| 申请公布号 |
EP0421667(A1) |
申请公布日期 |
1991.04.10 |
| 申请号 |
EP19900310574 |
申请日期 |
1990.09.27 |
| 申请人 |
NIPPON ZEON CO., LTD. |
发明人 |
OIE, MASAYUKI;KAWATA, SHOJI;YAMADA, TAKAMASA |
| 分类号 |
G03F7/023;G03F7/022;H01L21/027;H01L21/30 |
主分类号 |
G03F7/023 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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