Process and apparatus for producing transparent conductive film.

摘要

In a process for producing an In-O or In-Sn-O based transparent conductive film by a sputtering process, a sputtering is effected in such a condition that the intensity of a magnetic field on a surface of a target is adjusted in a range of 400 Oe or more so that the sputtering voltage, during sputtering film formation operation, is kept constant. An apparatus for procuding an In-O or In-Sn-O based transparent conductive film on a substrate 4 by a plasma discharge generated between the substrate 4 and a target 8, both of which are mounted in opposition to each other within a vacuum chamber 1, comprises an electromagnet 10 for adjusting the intensity of a magnetic field on the surface of the target 8 is provided on the rear surface side of the target 8, and a controller 13 for controlling the electric current supplied to the electromagnet 10, in accordance with a change in sputtering voltage, is so provided as to be connected to a DC power supply source 9 for the electromagnet 10.