Epoxy acrylate resins and photosensitive resin compositions therefrom.

摘要

Epoxy acrylate resins of this invention having a structure of the general formula (I) in which R is hydrogen or a lower alkyl group, R min is hydrogen or methyl group, and n is an interger from 0 to 20 are heat-resistant, solventsoluble, and photosensitive and photosensitive resin compositions containing said epoxy acrylate resins as main component exhibit high photosensitivity in addition to strong adhesion to substrates, good resistance to heat and chemicals, and good mechanical and electrical properties and are useful as materials for forming insulation films for multilayer devices and protective films for image sensors and as protective films for solder resists, plating resists, and color filters.