| 摘要 |
Block phenolic oligomers of formula (I) may be reacted alone or with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II), wherein X is from 2-7; wherein R is hydrogen, a lower alkyl or lower alkoxy group having 1-4 carbon atoms or a halogen group; and wherein R1 and R2 are individually selected from a hydrogen, hydroxy, a lower alkyl group or lower alkoxy group having 1 to 4 carbon atoms or a halogen group subject to the following provisos: (a) at least one of the ortho- or para-positions to the hydroxyls on the terminal phenolic moieties is unsubstituted, and (b) if either R1 and R2 is in the same position relative to the hydroxyl groups on the terminal phenolic moieties as R is to the hydroxyl on the interior phenolic moieties and the other R1 or R2 is hydrogen, then the R1 or R2 is not the same as R. The phenolic novolac resin is useful in radiation sensitive compositions and coated products with 0-quinone diazide compound wherein after radiation imaging and subsequent development, a positive resist image is obtained. |
