发明名称 PRODUCTION OF DIAMOND-LIKE THIN FILM
摘要 PURPOSE:To improve adhesion and joining properties by blowing an ionized gas for bombardment to a substrate disposed in a vacuum chamber to execute bombardment and then blowing a gaseous raw material into the chamber to allow a film formation reaction. CONSTITUTION:After the inside of the vacuum chamber 30 disposed with the substrate S is evacuated to about 10<-6> Torr via a discharge system 38, the gas for bombardment, such as Ar or N2, is introduced from a supply port 35 into the chamber and is ionized by a hot cathode filament 34 and a counter cathode 36 provided around the filament. The gas is accelerated by a grid 33 of the potential lower than the potential of the cathode 36 to bombard the surface of the substrate S. Low mol.wt. hydrocarbon or the gaseous raw material which can form low mol.wt. hydrocarbon by decomposition or reaction is introduced into the chamber from a gas supplying passage 37 and is ionized by the filament 34 and the cathode 36 to form the flow of hydrocarbon ions. This flow is accelerated by the grid 33 and is brought into collision against the substrate S to allow the film forming reaction, by which the diamond-like thin film is formed on the substrate.
申请公布号 JPH0380190(A) 申请公布日期 1991.04.04
申请号 JP19890214913 申请日期 1989.08.23
申请人 TDK CORP 发明人 SHIBAHARA MASANORI;UEDA KUNIHIRO;NAKAYAMA MASATOSHI
分类号 C30B29/04;C23C16/02;C23C16/26;C23C16/27;C23C16/50;C30B25/02 主分类号 C30B29/04
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