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发明名称
PHOTOSENSITIVE RESIN COMPOSITION AND PATTERN FORMATION USING THE SAME
摘要
申请公布号
EP0334233(A3)
申请公布日期
1991.04.03
申请号
EP19890104820
申请日期
1989.03.17
申请人
HITACHI CHEMICAL CO., LTD.;HITACHI, LTD.
发明人
KOIBUCHI, SHIGERU;ISOBE, ASAO;HASHIMOTO, MICHIAKI
分类号
G03C1/00;G03C1/72;G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/08
主分类号
G03C1/00
代理机构
代理人
主权项
地址
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