Exposure apparatus.

摘要

An alignment method for use in an exposure apparatus for printing a pattern of an original (2) onto different surface areas of a substrate (3), the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage (4); providing a reference mark (14) on an X-Y stage (24) for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors (12) which are provided to be associated with the alignment marks of the original, respectively; calculating a rotational error of the original with respect to the stage coordinate system, in theta direction, by using the positional errors; and rotationally moving the original supporting table in the theta direction so as to correct the rotational error.