| 摘要 |
Pre- and post-processing of a semiconductor wafer within a main vacuum chamber is accomplished by a wafer holder disposed within a clam shell-like device. The clam shell device includes a first member disposed above the wafer holder and a second member disposed below the wafer holder in a facing relationship to the first member. The first member and the second member each have a respective mating surface. The first member and the second member are movable between a closed position wherein the mating surface of each of the first member and second member hermetically engage each other in an open position. The clam shell device forms an interior chamber when in its closed position. Gases are evacuated from the interior chamber, exteriorally of the main chamber, when the clam shell device is in in a closed position to avoid contamination of the vacuum environment.
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