发明名称 Apparatus and method for aligning and focusing an image of a reticle onto a semiconductor wafer
摘要 A projection system provides a primary mirror with a thin nearly concentric shell which functions as a first mirror at shorter wavelengths for exposure purposes and functions as a second mirror surface at longer wavelengths for alignment purposes. The coating on the front surface of the shell is reflective to the exposing wavelengths and transmissive to the alignment illumination, and the coating on the back of the shell is reflective to the alignment wavelengths. This provides good focus and alignment of the images over two spectral regions.
申请公布号 US5003345(A) 申请公布日期 1991.03.26
申请号 US19890458482 申请日期 1989.12.27
申请人 GENERAL SIGNAL CORPORATION 发明人 MARKLE, DAVID A.
分类号 G03F7/20;G03F9/00 主分类号 G03F7/20
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