| 摘要 |
<p>PURPOSE:To adjust a luminance distribution of light sources for an exposure head by a method wherein a luminance distribution of beams emitted from a plurality of light sources is measured, a pitch dimension between luminance centers of the respective light sources is compared with a predetermined pitch dimension, and a mask is installed so that the pitch dimension between luminance centers many coincide with the predetermined pitch dimension. CONSTITUTION:The lighting state of LED chips 80 is picked up and stored in a storage medium 96. The storage medium 96 is loaded on an analyzing device 98 and, therein, a luminance distribution is obtained by integrating the image. Based on the obtained luminance distribution, a luminance peak position is determined with respect to each of the two LED chips 80. At the luminance peak position, 50% of the luminance peak value is evenly divided. A pitch dimension between the peak positions is determined as DELTAX. The determined DELTAX is compared with a sub-scanning pitch dimension X. If DELTAX<X, that the two LED chips 80 excessively come close to each other is judged, and a mask 86 is selected. If DELTAX>X, that the two LED chips 80 are excessively apart from each other is judged, and a mask 88 is selected. The selected mask 86 or 88 is fixed to an aperture 84.</p> |
