SOLID STATE LASER DEVICE FOR LITHOGRAPHY LIGHT SOURCE AND SEMICONDUCTOR LITHOGRAPHY METHOD

摘要

The present invention is devised in consideration of the above-mentioned state of affairs and attempts to actualize a compact solid state laser device of a wavelength as short as that of an excimer laser as a light source for lithography. The present invention relates to a device characterized in providing a solid state laser and nonlinear optical materials which convert a solid state laser ray of light output from the solid state laser in wavelength into a ray of light of a short wavelength and using them as a light source for lithography. Also, the present invention relates to a semiconductor lithography method characterized in converting a laser ray of light output from a solid state laser In wavelength into a ray of light of a short wavelength using nonlinear optical materials and drawing semiconductor circuit patterns by use of the laser ray of light of a short wavelength. Using the present invention, a light source which copes with the degree of integration of ICs after the 16MDRAM and is suitable for IC manufacturing processes can be obtained by a more safe and more simply constituted solid state laser compared with an excimer laser, thereby allowing accurate semiconductor circuit patterns to be formed.