发明名称 PRODUCTION OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To inspect the pattern of an object to be inspected with high accuracy by comparing the reference data by reference pattern data and the image pickup data of the lead frame to be inspected. CONSTITUTION:The lead frame 2 to be inspected passes below a camera 4 from a loader 5 and is transferred successively to an unloader 7 via a rejector 6 by an automatic frame feed mechanism. The reference pattern data of the pattern having an ideal shape is formed at this time and the image thereof is picked up by the camera 4. The storage data formed by digitizing this data is previously stored into the memory section 3a of a processing section 3. The permissible range of the lead positional deviation of the frame 2 is set to processing section 3 by an operation switch 8. On the other hand, the image of the frame 2 is picked up by the camera 4 and the image pickup data thereof is stored in the processing section 3. The reference data of the reference pattern data and the image pickup data of the frame 2 are compared in the processing section 3 and the decision that the lead frame is non-defective if the degree of the coincidence or dissidence is extremely small is stored into the processing section 3.
申请公布号 JPH0367108(A) 申请公布日期 1991.03.22
申请号 JP19890204172 申请日期 1989.08.07
申请人 FUJITSU LTD 发明人 NAKAJIMA HIROAKI;SUGIURA RIKIO;SUGAWARA TAKEHISA
分类号 G01B11/24;H01L21/66 主分类号 G01B11/24
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