发明名称 CHEMICAL VAPOR DEPOSITION SYSTEM CLEANER
摘要 <p>An apparatus for cleaning the interior surfaces of a vessel (1) which includes a cleaning head (2) supported and guided into the vessel by a rigid air shaft (3). The cleaning head (2) is supplied with a process fluid and directs and removes the process fluid from a cleaning zone located on the interior surface of the vessel (1). The process fluid is heated by a heat exchanger hose assembly (5) that is connected to the air shaft (3). The apparatus utilizes turbulent fluid flow, thermal shock, ultrasonic vibration and/or piezoelectric vibration to dislodge particulates from the inner surfaces of the vessel. The apparatus is useful for cleaning chemical vapor deposition reactors and other similar vessels.</p>
申请公布号 WO1991003328(A1) 申请公布日期 1991.03.21
申请号 US1990004910 申请日期 1990.08.29
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