发明名称 HIGH PURITY CHLORIC ACID
摘要 <p>A process for producing chloric acid which comprises converting an aqueous solution of hypochlorous acid containing at least 20 percent by weight of HOCl at a temperature in the range of from about 10 to about 120 °C to a reaction mixture comprising a dilute aqueous solution of chloric acid and gaseous by-products while continuously removing the gaseous by-products to produce a chloric acid solution containing about 10 percent or greater by weight of HClO3. Using the novel process it has been found that chloric acid can be produced efficiently at substantially reduced production costs using a process which can be operated commercially. In addition, the chloric acid solutions are produced in high concentrations and high purity being substantially free of impurities such as alkali metal ions, chloride ions and sulfate ions.</p>
申请公布号 WO1991003421(A1) 申请公布日期 1991.03.21
申请号 US1990005008 申请日期 1990.09.04
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址