发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To reduce a wiring resistance of a polyside for forming a first electrode and to increase a speed by forming a polysilicon film on the top of the first electrode and a sidewall, and oxidizing the polysilicon to form an insulating film. CONSTITUTION:Polysilicon films 5, 6 are formed on the top of a first electrode laminated with a silicide 4 on a polysilicon 3 and a sidewall, and insulating films 7a, 7b for isolating the first electrode from a second electrode 9 are formed by oxidizing the films 5, 6. As a result, the wiring resistance of the polyside (polysilicon 3/silicide 4) for forming the first electrode is reduced to increase the speed of signals transmitting in the first electrode.
申请公布号 JPH0364070(A) 申请公布日期 1991.03.19
申请号 JP19890199392 申请日期 1989.08.02
申请人 HITACHI LTD 发明人 OKUYAMA KOSUKE;TAKEDA TOSHIFUMI
分类号 H01L27/112;H01L21/8246 主分类号 H01L27/112
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