发明名称 WERKWIJZE VOOR HET REGELEN VAN DE SAMENSTELLING VAN EEN CHEMISCHE KOPERBEKLEDINGSOPLOSSING.
摘要 The pH of a chemical copper plating solution is exactly measured for a prolonged time by utilizing a copper oxide prepared by etching metallic copper in an 0.1-1 N inorganic acid then oxidizing the etched metallic copper in an aqueous 0.1-1 N alkali metal hydroxide solution as a main electrode for pH measurement or reducing agent concentration measurement in terms of pH. A combination of the pH measurement with well known procedures for measuring concentrations of cupric ions and a complexing agent exactly measures the pH and the concentrations of a reducing agent, cupric ions and a complexing agent for a continuation of longer time than the conventional procedures.
申请公布号 NL187325(B) 申请公布日期 1991.03.18
申请号 NL19800005140 申请日期 1980.09.12
申请人 HITACHI LTD. TE TOKIO, JAPAN. 发明人
分类号 G01N27/333;C23C18/16;G01N27/30;G01N27/416;(IPC1-7):G05D21/00 主分类号 G01N27/333
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