| 摘要 |
<p>PURPOSE:To improve the yield and the throughput, and also, to improve the display quality and to reduce the manufacturing cost by eliminating a resist, and thereafter, providing an insulating film for constituting a protective film, eliminating an insulating film of a picture element electrode part, and thereafter, eliminating a metallic film of the picture electrode part. CONSTITUTION:A transparent conductive film SUB1 for constituting a picture element electrode is provided, a metallic film DPI is provided on the transparent conductive film SUB1, a resist is applied onto the metallic film DPI, and on the resist, a pattern of a picture element electrode ITO1, a video signal line DL, a source electrode SD1 and a drain electrode SD2 is formed. subsequently, the metallic film DPI is brought to etching selectively, the transparent conductive film SB1 is brought to etching selectively, the resist is eliminated, and an insulating film GI for constituting a protective film is provided. Also, after eliminating the insulating film GI of the picture element electrode part, the metallic film DPI of the picture element electrode part ITO1 is eliminated. Accordingly, by only forming the pattern on the resist once, the transparent picture element electrode ITO1, the video signal line DL, and the source and the drain electrodes SD1, 2 are formed. In such a way, the yield and the throughput are improved, and also, the manufacturing cost becomes low.</p> |
