发明名称 EPITAXIAL GROWTH OF DIACETYLENE OR POLYDIACETYLENE
摘要 PURPOSE:To cause effective growth of a (poly)diacetylene thin film of the order of millimeter on a substrate by using a single crystal of (poly)diacetylene as a substrate in the epitaxial growth of (poly)diacetylene on a substrate. CONSTITUTION:A process for epitaxially growing diacetylene or polydiacetylene on a substrate, wherein a single crystal of diacetylene or polydiacetylene is used as the substrate. According to a conventional organic molecular beam epitaxy, the obtained diacetylene or polydiacetylene thin film is a polycrystal comprising particles of the order of micrometer and is not effective as a waveguide because of, for example, scattering during the guide of light wave. According to this invention, a large-area epitaxial film can be grown.
申请公布号 JPH0359014(A) 申请公布日期 1991.03.14
申请号 JP19890194361 申请日期 1989.07.28
申请人 FUJITSU LTD 发明人 YOSHIMURA TETSUZO
分类号 G02B6/13;C08F38/00;C30B29/54;G02B6/12;G02F1/35;G02F1/355;G02F1/361 主分类号 G02B6/13
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