| 摘要 |
This specification discloses a particle measuring apparatus characterized by means for passing a particle to be examined to a portion to be examined. First applying means applies an irradiating light from a first direction to the portion to be examined, second applying means applies an irradiating light from a second direction differing from the first direction to the portion to be examined. First and second photometering means photomets the lights radiated from the portion to be examined by the application of lights to the particle to be examined, relative to the first and second applying means, respectively.
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