| 摘要 |
<p>PURPOSE:To obtain a liquid crystal display device whose working efficiency is excellent and which have a low production cost and is difficult to cause a defect by constituting the protective film of a thin film transistor of resin having higher light transmissivity than that of an oriented film. CONSTITUTION:The protective film PSV1 is provided on the thin film transistor TFT and a transparent picture element electrode ITO1. the protective film PSV1 is formed mainly in order to protect the thin film transistor TFT from moisture, etc., and a substance which has high light transmissivity and is excellent in moisture resistance is used as the protective film. Namely, the protective film PSV1 is formed of aminosilane modified epoxy resin, so that a vacuum device such as an expensive CVD device, etc., is not needed in order to provide the protective film PSV1. Thus, the working efficiency is enhanced and the production cost is made low. Furthermore, an insulating film GI is not damaged in the case of forming the protective film PSV1 because the material of the protective film PSV1 is different from that of the insulating film GI, thereby preventing the defect of the thin film transistor TFT from occurring.</p> |
