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发明名称
Verfahren zum Dampfwachstum von Halbleitern
摘要
申请公布号
DE1519804(A1)
申请公布日期
1969.01.23
申请号
DE19661519804
申请日期
1966.03.31
申请人
HITACHI LTD.
发明人
IIDA,SHINYA;SUGITA,YOSHIMITSU
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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