| 摘要 |
PURPOSE:To improve sensitivity to exposure with UV having a prescribed wavelength, resolution and developability by forming a resist layer made of a compsn. contg. a specified alkali-soluble resin. CONSTITUTION:A resist layer is formed on a substrate by applying and drying a compsn. contg. an alkali-soluble resin obtd. by condensing prescribed phenols with aldehydes and a 1,2-quinonediazido compd. The resist layer is imagewise exposed with light having 300-380 nm wavelength and developed to form a pattern. The phenols are 20-80 mol% m-cresol, 0-50 mol% p-cresol and 20-80 mol% compd. represented by formula I other than m-cresolnd p-cresol. In formu la I, each of R<1>-R<3> is H, hydroxyl, 1-4C alkyl, etc. |
