发明名称 SKIN PATTERN MONITORING
摘要 <p>A method of monitoring the suitability of an image of a skin pattern for use in a subsequent verification or identification process, comprises: a) irradiating a region in which a skin pattern is expected; b) detecting the intensity of radiation from the irradiated region; c) comparing the detected intensity with a first threshold; d) if the detected intensity is greater than the first threshold, detecting the intensity after a predetermined time interval and comparing the second detected intensity with a second threshold defining an intensity greater than that of the first threshold; and e) generating at least a preliminary acceptance signal if the second intensity exceeds the second threshold.</p>
申请公布号 WO1991003030(A1) 申请公布日期 1991.03.07
申请号 GB1990001270 申请日期 1990.08.13
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