发明名称 Corpuscular beam optical device - compensates for illumination and imaging errors in irradiation of flat sample slide
摘要 A corpuscular beam optical device for irradiation of a sample slide causes a corpuscular beam of given radius to move over the sample pattern. The illuminating beam from a narrow polychromatic beam source (1) is split into two. The source (1) is followed by a suitable fixed shutter (2) across the diameter of the beam. The beam is driven, with the help of two x-y diffraciton elements (3) in separate planes, to the incident plane of a strongly magnifying telescopic lens system (4) comprising two lenses (5). The telescopic system is compensated, with respect to the distortion and colour error of the image rotation and magnification, by computer controlled detectors. USE/ADVANTAGE - Microlithography of flat sample. Can process ten billion image points on surface of 20 mm diameter. Enables exact perpendicular illumination and reduces distortion.
申请公布号 DE3929774(A1) 申请公布日期 1991.03.07
申请号 DE19893929774 申请日期 1989.09.02
申请人 KOOPS, HANS W. P., DIPL.-PHYS. DR., 6105 OBER-RAMSTADT, DE 发明人 KOOPS, HANS W. P., DIPL.-PHYS. DR., 6105 OBER-RAMSTADT, DE
分类号 H01J37/153;H01J37/30;H01J37/304 主分类号 H01J37/153
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