发明名称 |
LASER SHAPING WITH AN AREA PATTERNING MASK |
摘要 |
<p>LASER SHAPING WITH AN AREA PATTERNING MASK Laser sculpturing by ablation is controlled on an area basis by a mask pattern which determines light transmission in accordance with the desired degree of ablation as a function of position. In one embodiment, a set of binarally weighted masks is employed to produce an arbitrary change in the configuration of the surface of the workpiece being sculptured.</p> |
申请公布号 |
CA2021110(A1) |
申请公布日期 |
1991.03.06 |
申请号 |
CA19902021110 |
申请日期 |
1990.07.12 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
ROSE, JAMES W.;LEVINSON, RONNEN M.;LIU, YUNG S. |
分类号 |
G03F1/08;A61F9/00;A61F9/007;A61F9/008;A61F9/01;B23K26/06;G03F7/20;H01S3/00;(IPC1-7):A61N5/06 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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