发明名称 LASER SHAPING WITH AN AREA PATTERNING MASK
摘要 <p>LASER SHAPING WITH AN AREA PATTERNING MASK Laser sculpturing by ablation is controlled on an area basis by a mask pattern which determines light transmission in accordance with the desired degree of ablation as a function of position. In one embodiment, a set of binarally weighted masks is employed to produce an arbitrary change in the configuration of the surface of the workpiece being sculptured.</p>
申请公布号 CA2021110(A1) 申请公布日期 1991.03.06
申请号 CA19902021110 申请日期 1990.07.12
申请人 GENERAL ELECTRIC COMPANY 发明人 ROSE, JAMES W.;LEVINSON, RONNEN M.;LIU, YUNG S.
分类号 G03F1/08;A61F9/00;A61F9/007;A61F9/008;A61F9/01;B23K26/06;G03F7/20;H01S3/00;(IPC1-7):A61N5/06 主分类号 G03F1/08
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