发明名称 |
METHOD FOR MANUFACTURING POLYIMIDE THIN FILM AND APPARATUS |
摘要 |
<p>A method of manufacturing a polyimide thin film which comprises supplying vapors of a polyimide starting material comprising a plurality of polyimide forming monomers into a plasma atmosphere, transferring the ionized polyimide starting material, under an electric field, to the surface of a glass or metallic substrate and depositing thereon, and heating the same during or after deposition, thereby forming a polyimide thin film as an orientation film on the substrate, as well as an apparatus for manufacturing a polyimide thin film.</p> |
申请公布号 |
EP0376333(A3) |
申请公布日期 |
1991.03.06 |
申请号 |
EP19890124109 |
申请日期 |
1989.12.28 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
AKAGI, YOSHIRO;ISHINO, MARIKO;INOUE, ATSUHISA;KAMINISHI, SHIGERU;TANIGUCHI, HIROSHI |
分类号 |
C08G73/10;G02F1/1337;(IPC1-7):C08G73/10;G02F1/133;B05D5/12 |
主分类号 |
C08G73/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|