发明名称 METHOD FOR MANUFACTURING POLYIMIDE THIN FILM AND APPARATUS
摘要 <p>A method of manufacturing a polyimide thin film which comprises supplying vapors of a polyimide starting material comprising a plurality of polyimide forming monomers into a plasma atmosphere, transferring the ionized polyimide starting material, under an electric field, to the surface of a glass or metallic substrate and depositing thereon, and heating the same during or after deposition, thereby forming a polyimide thin film as an orientation film on the substrate, as well as an apparatus for manufacturing a polyimide thin film.</p>
申请公布号 EP0376333(A3) 申请公布日期 1991.03.06
申请号 EP19890124109 申请日期 1989.12.28
申请人 SHARP KABUSHIKI KAISHA 发明人 AKAGI, YOSHIRO;ISHINO, MARIKO;INOUE, ATSUHISA;KAMINISHI, SHIGERU;TANIGUCHI, HIROSHI
分类号 C08G73/10;G02F1/1337;(IPC1-7):C08G73/10;G02F1/133;B05D5/12 主分类号 C08G73/10
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