| 发明名称 |
TRANSPARENT DISSOLUTION RATE MODIFIERS FOR PHOTORESISTS |
| 摘要 |
A photosensitive composition containing an alkali soluble resin, a quinone diazide compound and a transparent, hydrophobic plasticizer which is preferably a dihydroabietyl phthalate, in a solvent mixture. After drying and imagewise exposing, the composition is developed to produce a photoresist image.
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| 申请公布号 |
CA2023423(A1) |
申请公布日期 |
1991.03.06 |
| 申请号 |
CA19902023423 |
申请日期 |
1990.08.16 |
| 申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
OSUCH, CHRISTOPHER E.;MCFARLAND, MICHAEL J. |
| 分类号 |
G03F7/023;G03F7/004;G03F7/022;G03F7/039;H01L21/027;(IPC1-7):G03F7/022;G03F7/038 |
主分类号 |
G03F7/023 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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