| 摘要 |
<p>PURPOSE:To obtain a photopolymer composition which has such high sensitivity as to be cured in air within a short time by mixing a base comprising a photocurable resin and a photopolymerization initiator with an aminobenzophenone derivative as a sensitizer. CONSTITUTION:A photopolymer composition is obtained by mixing a base comprising a photocurable resin [e.g. one comprising a base resin such as a phenol novolac epoxy (meth)acrylate, an oligomer such as an oligoester acrylate and a diluent monomer such as N-vinylpyrrolidone] and a photopolymerization initiator (e.g. organic peroxide) with an aminobenzophenone derivative as a sensitizer [e.g. 4,4'-bis(dimethylamino)benzophenone]. In this way, a photopolymer having such high sensitivity as to be cured in air within a short time can be obtained without the necessity for a nitrogen atmosphere. Therefore the production is easy and the cost production is possible.</p> |
