| 摘要 |
In a method for cleaning process gases containing gaseous impurities, the process gases are conducted along a process-gas passage running through a reactor plant (1, 2, 3), and through a dust separator (4) communicating with the process-gas passage. An absorbent that reacts with the gaseous impurities is injected in finely divided form into the process-gas passage in order to react with the gaseous impurities and form particles which are separated in the reactor plant (1, 2, 3) and the dust separator (4). The absorbent used comprises both fresh absorbent and a portion of the particles separated in the reactor plant and the dust separator. This portion of particles separated in the reactor plant and the dust separator are re-injected together with water into the process-gas passage at a first site (B). At least the main part of the fresh absorbent is injected into the process-gas passage at a second site (A; A') which is separate from the first site (B). |
