Appts. for the vapour deposition in a vacuum of films on substrates comprises evaporating chamber with the material to be evaporated and surrounded by a heating element. A sleeve connects this chamber to an identical collimation chamber. A sleeve on the other side of the latter faces the substrate to be coated.
申请公布号
HUT54424(A)
申请公布日期
1991.02.28
申请号
HU19890004783
申请日期
1989.01.20
申请人
KIEVSKIJJ POLITEKHNICHESKIJJ INSTITUT IMENI 50-LETIA VELIKOJJ OKTJABRSKOJJ SOCIALISTICHESKOJJ REVOLJUCII,SU
