| 摘要 |
PURPOSE:To stabilize the sensitivity to irradiation with a laser beam by bringing a substrate into contact with object respectively having large heat capacities at the time of baking and cooling. CONSTITUTION:A photoresist is applied by a spin coating on a glass substrate 1 and is dried to form a photoresist film 2. A thermostatic chamber for baking this film 2 is kept at a prescribed set temp. and is brought into contact with the object 3 having the heat capacity larger than the glass substrate inserted into the layer and is thereby baked. The substrate 1 is thereafter taken out of the thermostatic chamber and the entire surface of the rear surface of the substrate 1 is brought into contact with another object 4 which is kept at room temp. and has the large heat capacity by which the substrate is cooled to room temp. The change in the temp. of the substrate is expedited in this way and the substrate is stably maintained at the set temp. The sensitivity of the respective substrates to the irradiation with the laser beam is thus stabilized. |
