| 摘要 |
PURPOSE:To restrain a titanium silicide from cohering in an annealing process to be executed later by a method wherein the titanium silicide is thermally oxidized in advance and an oxide film is formed on its surface. CONSTITUTION:After a titanium silicide film 13 has been formed, a heat treatment for oxidation is executed. That is to say, after the titanium silicide film 13 has been formed, the heat treatment is executed in an atmosphere of oxygen at a temperature of 600 deg.C or higher and 1000 deg.C or lower for about 30sec or higher. The surface of the titanium silicide film 13 is oxidized by this heat treatment, and a titanium oxide (TiOx) or silicon oxide (SiO2) film 14 is formed. The oxide film 14 formed on the surface of the titanium silicide 13 in this manner is in a firm close-contact state at an interface between itself and the titanium silicide film; the oxide film is provided with a highly heat-resistant property and is not softened at 1000 deg.C or lower. Thereby, even when the titanium silicide film is softened and is going to flow by a heat treatment such as an annealing operation at 800 deg.C or higher and about 1000 deg.C or lower to be executed later, its movement is stopped by the oxide film. |
