摘要 |
PURPOSE:To stably form patterns of a high resolution which are free from halation and notching even when the compsn. is used for a high-reflectivity substrate by adding a specific light absorbent to the compsn. CONSTITUTION:A novolak resin and a quinone diazide photosensitive agent are incorporated into this compsn. and further, the compd. expressed by formula I is incorporated therein. In the formula, R denotes H, 1 to 5C alkyl, 2 to 5C alkoxy, etc. The compd. which exhibits the absorption max. for the light of a desired region among the above-mentioned compds. is usable and the more specific example thereof includes the compd. expressed by formula II, etc. |